Obstacle strength of binary junction due to dislocation dipole formation: An 
in-situ transmission electron microscopy study

Haghighat, Seyed Masood Hafez; Schäublin, Robin E.

doi:10.1016/j.jnucmat.2015.06.054

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Obstacle strength of binary junction due to dislocation dipole formation: An in-situ transmission electron microscopy study

Haghighat, S. M. H., & Schäublin, R. E. (2015). Obstacle strength of binary junction due to dislocation dipole formation: An in-situ transmission electron microscopy study. Journal of Nuclear Materials, 465, 648-652. doi:10.1016/j.jnucmat.2015.06.054.

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Creators:
Haghighat, Seyed Masood Hafez^{1, 2}, Author
Schäublin, Robin E.^{3, 4}, Author

Affiliations:
1Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society, ou_1863381
2Ecole Polytechnique Fédérale de Lausanne (EPFL), Centre de Recherches en Physique des Plasmas, Association Euratom-Confédération Suisse, Villigen PSI, Switzerland, ou_persistent22
3Ecole Polytechnique Fédérale de Lausanne (EPFL), Centre de Recherches en Physique des Plasmas, Association Euratom-Confédération Suisse, CH 5232 Villigen PSI, Switzerland, ou_persistent22
4Laboratory of Metal Physics and Technology, Department of Materials, ETH Zurich, Zurich, Switzerland, ou_persistent22

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Language(s): eng - English

Dates: Published Online: 2015-07-02Date issued: 2015-10

Publication Status: Issued

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Identifiers: DOI: 10.1016/j.jnucmat.2015.06.054

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Title: Journal of Nuclear Materials

Source Genre: Journal

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Pages: - Volume / Issue: 465 Sequence Number: - Start / End Page: 648 - 652 Identifier: ISSN: 0022-3115
CoNE: https://pure.mpg.de/cone/journals/resource/954925416962